06555834 is referenced by 20 patents and cites 3 patents.

In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of N

2

is provided across parts of the beam path in or adjacent to moving components of the apparatus. The laminar flow is faster than the maximum speed of the moving components and the diffusion rate of air thereby minimizing the contamination of the N

2

by mixing with air. Laminar flow may be ensured by providing partitions to divide the beam path into separate spaces, by covering rough or non-planar surfaces in components on or adjacent to the laminar flow and by providing aerodynamic members.

Title
Gas flushing system for use in lithographic apparatus
Application Number
9/704581
Publication Number
6555834 (B1)
Application Date
November 3, 2000
Publication Date
April 29, 2003
Inventor
Erik R Loopstra
Heeze
US
Agent
Pillsbury Winthrop
US
Assignee
ASML Netherlands
US
IPC
G21G 5/00
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