06542220 is referenced by 33 patents and cites 1 patents.

A lithographic apparatus has at least one compartment closely surrounding at least one of the mask and substrate holders but not either of the illumination or projection systems so as to reduce the volume that must be purged with gas transparent to the projection radiation. In a scanner, the compartment surrounding the mask holder preferably moves with the mask table and may be formed by a combination of a frame-shaped mask table driven in the scanning operation and stationary plates fixed relative to the projection and illumination systems.

Title
Purge gas systems for use in lithographic projection apparatus
Application Number
9/704828
Publication Number
6542220 (B1)
Application Date
November 3, 2000
Publication Date
April 1, 2003
Inventor
Erik R Loopstra
Heeze
US
Yim Bun P Kwan
Eindhoven
US
Bernardus A J Luttikhuis
Nuenen
US
Marcel K M Baggen
Nuenen
US
Tjarko A R van Empel
Eindhoven
US
Raymond L J Schrijver
Eindhoven
US
Agent
Pillsbury Winthrop
US
Assignee
ASML Netherlands
US
IPC
G03B 27/42
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