06514667 is referenced by 53 patents.

A lithographic structure and method of fabrication and use thereof having a plurality of layers at least one of which is a an RCHX layer which comprises a material having structural formula R:C:H:X, wherein R is selected from the group consisting of Si, Ge, B, Sn, Fe, Ti and combinations thereof and wherein X is not present or is selected from the group consisting of one or more of O, N, S, and F and a layer of an energy active material. The RCHX layers are useful as hardmask layers, anti-reflection layers and hardmask anti-reflection layers. The RCHX layer can be vapor-deposited and patterned by patterning the energy active material and transferring the pattern to the RCHX layer.

Title
Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof
Application Number
9/932002
Publication Number
6514667 (B2)
Application Date
August 17, 2001
Publication Date
February 4, 2003
Inventor
Vishnubhai Vitthalbhai Patel
Yorktown Heights
NY, US
Arpan Pravin Mahorowala
White Plains
NY, US
Scott David Halle
Hopewell Junction
NY, US
Alfred Grill
White Plains
NY, US
Katherina Babich
Chappaqua
NY, US
Marie Angelopoulos
Cortlandt
NY, US
Agent
Daniel P Morris
US
Assignee
International Business Machines Corporation
NY, US
IPC
G03F 7/075
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