06511539 is referenced by 349 patents and cites 5 patents.

An improved apparatus and method for substrate layer deposition in which substrate layers are grown by carrier gas delivery of sequential pulses of reactants to the substrate surface. At least one of the reactants comprises excited species, e.g., radicals. In a specific embodiment, the apparatus of this invention provides sequential repeated pulses of reactants in a flow of carrier gas for reaction at a substrate surface. The reactant pulses are delivered with sufficient intervening delay times to minimize undesirable reaction between reactants in adjacent pulses in the gas phase or undesired uncontrolled reactions on the substrate surface.

Title
Apparatus and method for growth of a thin film
Application Number
9/392371
Publication Number
6511539 (B1)
Application Date
September 8, 1999
Publication Date
January 28, 2003
Inventor
Ivo Raaijmakers
Bilthoven
US
Agent
Knobbe Martens Olson & Bear
US
Assignee
ASM America
AZ, US
IPC
C30B 25/14
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