06387783 is referenced by 76 patents.

Methods for forming a T-gate on a substrate are provided that employ a hybrid resist. The hybrid resist specifically is employed to define a base of the T-gate on the substrate with very high resolution. To define a base of the T-gate, a hybrid resist layer is deposited on the substrate. A mask having a reticle feature with an edge is provided and is positioned above the hybrid resist layer so that the edge of the reticle feature is above a desired location for the base of the T-gate. Thereafter, the hybrid resist layer is exposed to radiation through the mask, and the exposed hybrid resist layer is developed to define an opening therein for the base of the T-gate. Preferably the loop feature formed in the hybrid resist layer by the reticle feature during exposure is trimmed. The T-gate may be completed by employing any known T-gate fabrication techniques.

Title
Methods of T-gate fabrication using a hybrid resist
Application Number
9/299267
Publication Number
6387783 (B1)
Application Date
April 26, 1999
Publication Date
May 14, 2002
Inventor
Paul A Rabidoux
Winooski
VT, US
David V Horak
Essex Junction
VT, US
Steven J Holmes
Milton
VT, US
Mark C Hakey
Fairfax
VT, US
Toshiharu Furukawa
Essex Junction
VT, US
Agent
DeLio & Peterson
US
Agent
Mark F Chadurjian
US
Kelly M Reynolds
US
Assignee
International Business Machines Corporation
NY, US
IPC
H01L 21/28
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