06312971 is referenced by 327 patents and cites 46 patents.

A process for forming a relatively high quality, lower cost organic semiconductor film is provided. A substrate is formed by depositing an organic semiconductor film via a lower cost method such as printing or spin coating on a support substrate. A portion of a solvent is vaporized to bring the vapor into contact with the film. The chemical potential of the vapor molecules is controlled to provide an interaction with the organic semiconductor film to alter the molecular arrangement of the film. The process further entails placing the substrate on a first temperature controlled stage and placing the solvent on a second temperature controlled stage. The chemical potential of the vapor is adjusted by controlling the temperature of the solvent. Appropriate annealing conditions are obtained by adjusting the temperature of the solvent, the substrate, and the anneal time. The process can assist manufacturing of lower cost displays that utilize arrays of organic thin-film transistors.

Title
Solvent annealing process for forming a thin semiconductor film with advantageous properties
Application Number
9/652486
Publication Number
6312971 (B1)
Application Date
August 31, 2000
Publication Date
November 6, 2001
Inventor
Jianna Wang
Waltham
MA, US
Karl Amundson
Cambridge
MA, US
Agent
Testa Hurwitz & Thibeault
US
Assignee
E Ink Corporation
MA, US
IPC
H01L 51/40
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