06312134 is referenced by 129 patents and cites 12 patents.

The invention is a seamless projection lithography system that eliminates the need for masks through the use of a programmable Spatial Light Modulator (SLM) with high parallel processing power. Illuminating the SLM with a radiation source (

1

), which while preferably a pulsed laser may be a shuttered lamp or multiple lasers with alternating synchronization, provides a patterning image of many pixels via a projection system (

4

) onto a substrate (

5

). The preferred SLM is a Deformable Micromirror Device (

3

) for reflective pixel selection using a synchronized pulse laser. An alternative SLM is a Liquid Crystal Light Valve (LCLV) (

45

) for pass-through pixel selection. Electronic programming enables pixel selection control for error correction of faulty pixel elements. Pixel selection control also provides for negative and positive imaging and for complementary overlapping polygon development for seamless uniform dosage. The invention provides seamless scanning by complementary overlapping scans to equalize radiation dosage, to expose a pattern on a large area substrate (

5

). The invention is suitable for rapid prototyping, flexible manufacturing, and even mask making.

Title
Seamless, maskless lithography system using spatial light modulator
Application Number
9/230438
Publication Number
6312134 (B1)
Application Date
January 23, 1999
Publication Date
November 6, 2001
Inventor
Jeffrey M Hoffman
Sierra Madre
CA, US
Thomas J Dunn
Mohegan Lake
NY, US
Kanti Jain
Briarcliff
NY, US
Agent
Carl C King
US
Assignee
Anvik Corporation
NY, US
IPC
G02B 7/182
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