06300036 is referenced by 5 patents and cites 9 patents.

The compounds are of a class of photosensitive polymers for use in chemically amplified photoresists. These photoresists produce sharp line patterns when exposed with an ArF excimer laser. The polymer composition includes a copolymer and the photoresist composition includes a terpolymer with a photo acid generator. The resulting chemically amplified photoresist compositions have strong resistance to dry etching, possess excellent adhesion to film material, and are capable of being developed using conventional developers.

Title
Photosensitive polymers and chemically amplified photoresist compositions using the same
Application Number
9/203669
Publication Number
6300036 (B1)
Application Date
December 1, 1998
Publication Date
October 9, 2001
Inventor
Chun Geun Park
Kyunggi-do
US
Dong Won Jung
Seoul
US
Yool Kang
Kyunggi-do
US
Sang Jun Choi
Kyunggi-do
US
Agent
Jones Volentine P L L C
US
Assignee
Samsung Electronics
US
IPC
B03F 7/004
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