06255126 is referenced by 227 patents and cites 20 patents.

A method of forming an interconnection, including a spring contact element, by lithographic techniques. In one embodiment, the method includes applying a masking material over a first portion of a substrate, the masking material having an opening which will define a first portion of a spring structure, depositing a structure material (e.g., conductive material) in the opening, and overfilling the opening with the structure material, removing a portion of the structure material, and removing a first portion of the masking material. In this embodiment, at least a portion of the first portion of the spring structure is freed of masking material. In one aspect of the invention, the method includes planarizing the masking material layer and structure material to remove a portion of the structure material. In another aspect, the spring structure formed includes one of a post portion, a beam portion, and a tip structure portion.

Title
Lithographic contact elements
Application Number
9/205023
Publication Number
6255126 (B1)
Application Date
December 2, 1998
Publication Date
July 3, 2001
Inventor
Gary W Grube
Pleasanton
CA, US
Benjamin N Eldridge
Danville
CA, US
Gaetan L Mathieu
Livermore
CA, US
Agent
Blakely Sokoloff Taylor & Zafman
US
Assignee
FormFactor
CA, US
IPC
G01R 31/26
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