06251558 is referenced by 7 patents and cites 16 patents.

A chemically amplified resist contains the following components:

a polymer with carboxylic acid anhydride groups and tert-butylester, tert-butoxycarbonyloxy, tetrahydrofuranyl, or tetrahydropyranyl groups;

a photoreactive compound which, when exposed or electron-irradiated, releases a sulfonic acid having a pK

a

value>0.5 (acid former);

a compound that can enter into a reversible chemical reaction with the sulfonic acid (buffer compound); and

a solvent.

Title
Chemically amplified resist
Application Number
9/65010
Publication Number
6251558 (B1)
Application Date
April 23, 1998
Publication Date
June 26, 2001
Inventor
Ewald Guenther
Herzogenaurach
US
Rainer Leuschner
Grossenseebach
US
Klaus Elian
Erlangen
US
Agent
Werner H Stemer
US
Laurence A Greenberg
US
Herbert L Lerner
US
Assignee
Siemens Aktiengesellschaft
US
IPC
G06F 7/004
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