06191429 is referenced by 540 patents and cites 21 patents.

Improvements in a focusing apparatus having an objective optical system for optically manufacturing a workpiece, forming a desired pattern on a surface of a workpiece or inspecting a pattern on a workpiece and used to adjust the state of focusing between the surface of the workpiece and the objective optical system. The focusing apparatus has a first detection system having a detection area at a first position located outside the field of the objective optical system, a second detection system having a detection area at a second position located outside the field of the objective optical system and spaced apart from the first position, and a third detection system having a detection area at a third position located outside the field of the objective optical system and spaced apart from each of the first and second positions. A calculator calculates a deviation between a first focus position and a target focus position and temporarily stores a second focus position at the time of detection made by the first detection system. A controller controls focusing on the surface of the workpiece on the basis of the calculated deviation, the stored second focus position and a third focus position when the area on the workpiece corresponding to the detection area of the first detection system is positioned in the field of the objective optical system by relative movement of the workpiece and the objective optical system.

Title
Projection exposure apparatus and method with workpiece area detection
Application Number
9/287702
Publication Number
6191429 (B1)
Application Date
April 6, 1999
Publication Date
February 20, 2001
Inventor
Kyoichi Suwa
Tokyo
US
Agent
Skjerven Morrill MacPherson
US
Agent
Mark E Schmidt
US
Norman R Klivans
US
Assignee
Nikon Precision
CA, US
IPC
G01J 1/20
View Original Source