06146979 is referenced by 138 patents and cites 172 patents.

A technique for forming films of material (14) from a donor substrate (10). The technique has a step of introducing gas-forming particles (12) through a surface of a donor substrate (10) to a selected depth underneath the surface. The gas-forming particles form a layer of microbubbles within the substrate. A global heat treatment of the substrate then creates a pressure effect to separate a thin film of material from the substrate. Additional gas-forming particles are introduced into the donor substrate and a second thin film of material is then separated from the donor substrate. In a specific embodiment, the gas-forming particles are implanted using a plasma immersion ion implantation method.

Title
Pressurized microbubble thin film separation process using a reusable substrate
Application Number
9/26032
Publication Number
6146979
Application Date
February 19, 1998
Publication Date
November 14, 2000
Inventor
Nathan W Cheung
Albany
CA, US
Francois J Henley
Los Gatos
CA, US
Agent
Townsend and Townsend and Crew
Assignee
Silicon Genesis Corporation
CA, US
IPC
H01L 21/30
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