06057063 is referenced by 50 patents and cites 9 patents.

A process for creating and verifying a design of phase-shifted masks utilizing at least one phase shift region employing a computer-aided design system. A chip design is provided. A phase-shift mask design capable of producing the chip design is created. Features in a design of the phase-shifted mask that require phase shifting are located. Uncolored phase regions are created on opposite sides of the features. Proper phase termination of the phase regions is ensured based upon space constraints of a phase-shifted mask technique utilized. Phases are determined for the phase regions. Whether coloring errors and un-phase-shiftable design features exist is determined. Mask process specific overlaps and expansions are applied to the mask design to prepare designed data levels for mask manufacture. A residual phase edge image removal design is derived.

Title
Phase shifted mask design system, phase shifted mask and VLSI circuit devices manufactured therewith
Application Number
8/824700
Publication Number
6057063
Application Date
April 14, 1997
Publication Date
May 2, 2000
Inventor
Alfred K Wong
Beacon
NY, US
Mark A Lavin
Katonah
NY, US
Young O Kim
San Jose
CA, US
Ioana C Graur
Poughkeepsie
NY, US
Lars W Liebmann
Poughquag
NY, US
Agent
Pollock Vande Sande & Amernick
Assignee
International Business Machines Corporation
NY, US
IPC
G03F 9/00
View Original Source