05976261 is referenced by 54 patents and cites 8 patents.

A method and apparatus for multi-zone injection apparatus of multiple process gases onto a work piece during manufacture. The multi-zone injection apparatus uses a gas injection plate with multiple injection zones to deliver the multiple process gases into the chamber for deposition onto the work piece (for example, a silicon wafer). The gas showerhead separates the multiple process in a manner that avoids premixing the process gases, thereby minimizing gas-phase nucleation and particulate generation. The showerhead also allows real-time independent control over the gas flow rates in N channels to achieve deposition uniformity. Different gases can be configured in adjacent channels to provide M zones of multi-gas radial control.

Title
Multi-zone gas injection apparatus and method for microelectronics manufacturing equipment
Application Number
8/678297
Publication Number
5976261
Application Date
July 11, 1996
Publication Date
November 2, 1999
Inventor
Ahmad Kermani
Danville
CA, US
Yong Jin Lee
San Jose
CA, US
Mehrdad M Moslehi
Los Altos
CA, US
Agent
Gray Cary Ware & Freidenrich
Assignee
CVC Products
CA, US
IPC
C23C 16/00
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