05953591 is referenced by 81 patents and cites 10 patents.

A process of using a transport system for transporting substrate wafer, for making semiconductor integrated circuits and liquid crystal display panels and the like advanced devices, is presented. The object is to prevent surface degradation which may be inflicted on the surface to interfere with proper processing of the substrate. The substrate wafers are delivered to process chambers always in clean surface conditions. A method illustrated utilizes a purge gas containing an inert gas or a mixture of an inert gas and oxygen for flowing inside the tunnel space, and a semiconductor laser detection system to detect the contamination levels within the tunnel space, and the transport parameters are controlled according to the measured data.

Title
Process for laser detection of gas and contaminants in a wafer transport gas tunnel
Application Number
8/894497
Publication Number
5953591
Application Date
July 29, 1997
Publication Date
September 14, 1999
Inventor
Tadahiro Ohmi
Sendai
JP
Masayuki Toda
Yonezawa
JP
Yoshio Ishihara
Tsukuba
JP
Agent
Darby & Darby
Assignee
Nippon Sanso Corporation
IPC
H01L 21/30
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