05920487 is referenced by 36 patents and cites 11 patents.

Integrated circuit designs are continually shrinking in size. Lithographic processes are used to transfer these designs to a semiconductor substrate. These processes typically require that the exposure wavelength of light be shorter than the smallest dimension of the elements within the circuit design. When this is not the case, exposure energy such as light behaves more like a wave than a particle. Additionally, mask manufacturing, photoresist chemical diffusion, and etch effects cause pattern transfer distortions. The result is that circuit elements do not print as designed. To counter this effect the circuit designs themselves can be altered so that the final printed results better matches the initial desired design. The process of altering designs in this way is called Lithographic Proximity Correction (LPC). Square (142), cross (162), octagon (172), and hammerhead (202) serifs are added to integrated circuit designs by shape manipulation functions to perform two dimensional (2-D) LPC.

Title
Two dimensional lithographic proximity correction using DRC shape functions
Application Number
8/810561
Publication Number
5920487
Application Date
March 3, 1997
Publication Date
July 6, 1999
Inventor
Michael E Kling
Austin
TX, US
Clyde H Browning
Briarcliff
TX, US
Kevin D Lucas
Austin
TX, US
Bernard J Roman
Austin
TX, US
Warren D Grobman
Austin
TX, US
Alfred J Reich
Austin
TX, US
Agent
Bruce E Hayden
Assignee
Motorola
TX, US
IPC
G03F 1/00
G03F 7/26
G03F 17/50
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