05900340 is referenced by 196 patents and cites 9 patents.

Integrated circuit designs are continually shrinking in size. Lithographic processes are used to pattern these designs onto a semiconductor substrate. These processes typically require that the wavelength of exposure used during printing be significantly shorter than the smallest dimension of the elements within the circuit design. When this is not the case, the exposure radiation behaves more like a wave than a particle. Additionally, mask manufacturing, photoresist chemical diffusion and etch effects cause pattern transfer distortions. The result is that circuit elements do not print as designed. To counter this effect the designs themselves can be altered so that the final printed results better match the initial desired design. The process of altering designs in this way is called Lithographic Proximity Correction (LPC). Edge assist shapes and edge biasing features are added to integrated circuit designs by shape manipulation functions to perform one dimensional (1-D) LPC.

Title
One dimensional lithographic proximity correction using DRC shape functions
Application Number
8/805863
Publication Number
5900340
Application Date
March 3, 1997
Publication Date
May 4, 1999
Inventor
Bernard J Roman
Austin
TX, US
Warren D Grobman
Austin
TX, US
Michael E Kling
Austin
TX, US
Kevin D Lucas
Austin
TX, US
Alfred J Reich
Austin
TX, US
Agent
Daniel D HIll
Assignee
Motorola
IL, US
IPC
G03F 9/00
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