05882411 is referenced by 84 patents and cites 1 patents.

A reactor for plasma-enhanced chemical vapor deposition having a showerhead electrode facing the wafer being CVD deposited, the showerhead having a large number of jetting holes for jetting processing gas towards the wafer. Two deep grooves are formed around the area of the showerhead containing the jetting holes. The grooves are formed from opposite sides of the showerhead and are radially offset from each other, thereby forming a thin wall between the grooves in the body of the showerhead. The thin wall acts as a thermal choke, thus reducing the heat flow to the support of the showerhead and also rendering the temperature distribution more uniform across the face of the showerhead. The thin wall further acts as a mechanical bellows to accommodate differential thermal expansion between the showerhead and its support.

Title
Faceplate thermal choke in a CVD plasma reactor
Application Number
8/735386
Publication Number
5882411
Application Date
October 21, 1996
Publication Date
March 16, 1999
Inventor
Alex Schreiber
San Jose
CA, US
Jun Zhao
Cupertino
CA, US
Agent
Charles S Guenzer
Assignee
Applied Materials
CA, US
IPC
C23C 16/00
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