05876899 is referenced by 10 patents and cites 10 patents.

A method for making an acrylic resin photoresist characterized by polymerization of an acrylic monomer in a solvent that dissolves all monomers and resultant polymers. The use of the solvent permits formation of acrylic resins suitable for use in the preparation of photoresists without recovery from its reaction mixture. Photoresists prepared from such polymers have improved transparency, especially at exposures of 193 mn or less.

Title
Photoresist compositions
Application Number
8/718099
Publication Number
5876899
Application Date
September 18, 1996
Publication Date
March 2, 1999
Inventor
Manuel DoCanto
Stoughton
MA, US
Robert L Brainard
Wayland
MA, US
Gary N Taylor
Marlborough
MA, US
Charles R Szmanda
Westborough
MA, US
Agent
Darryl P Frickey
Peter F Corless
Robert L Goldberg
Assignee
Shipley Company L L C
MA, US
IPC
C03F 220/10
G03C 1/492
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