05851294 is referenced by 53 patents and cites 34 patents.

A system for injecting a gaseous substance into a semiconductor processing chamber. The injection system includes at least one plenum formed in a plenum body and a plurality of nozzles associated with each plenum for injecting gaseous substances from the plenums into the chamber. A conduit structure transports gaseous substances along an indirect path from the plenum to the nozzles. The nozzles are positioned and configured to provide a uniform distribution of gaseous substances across the wafer surface.

Title
Gas injection system for semiconductor processing
Application Number
546885
Publication Number
5851294
Application Date
September 12, 1997
Publication Date
December 22, 1998
Inventor
Ron van Os
Sunnyvale
CA, US
Simon Selitser
Fremont
CA, US
Richard H Matthiesen
Scotts Valley
CA, US
Lydia J Young
Palo Alto
CA, US
Agent
Flehr Hohbach Test Albritton & Herbert
Assignee
Watkins Johnson Company
CA, US
IPC
H01J 37/32
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