05825043 is referenced by 948 patents and cites 13 patents.

Improvements in a focusing apparatus having an objective optical system for optically manufacturing a workpiece, forming a desired pattern on a surface of a workpiece or inspecting a pattern on a workpiece and used to adjust the state of focusing between the surface of the workpiece and the objective optical system. The focusing apparatus has a first detection system having a detection area at a first position located outside the field of the objective optical system, a second detection system having a detection area at a second position located outside the field of the objective optical system and spaced apart from the first position, and a third detection system having a detection area at a third position located outside the field of the objective optical system and spaced apart from each of the first and second positions. A calculator calculates a deviation between a first focus position and a target focus position and temporarily stores a second focus position at the time of detection made by the first detection system. A controller controls focusing on the surface of the workpiece on the basis of the calculated deviation, the stored second focus position and a third focus position when the area on the workpiece corresponding to the detection area of the first detection system is positioned in the field of the objective optical system by relative movement of the workpiece and the objective optical system.

Title
Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
Application Number
8/727695
Publication Number
5825043
Application Date
October 7, 1996
Publication Date
October 20, 1998
Inventor
Kyoichi Suwa
Tokyo
JP
Agent
Skjerven Morrill MacPherson Franklin & Friel
Agent
Norman R Klivans
Assignee
Nikon Precision
CA, US
IPC
G01N 21/86
G01J 1/20
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