05740068 is referenced by 195 patents and cites 21 patents.

A method for performing optical proximity correction is disclosed that not only limits the optical proximity correction to electrically relevant structures, but also improves the accuracy of the corrections by processing individual feature edges, and minimizes the mask manufacturing impacts by avoiding the introduction of jogs into the design. Critical edge regions of the relevant electrical structures are analyzed, sorted and manipulated to receive optical proximity corrections.

Title
Fidelity enhancement of lithographic and reactive-ion-etched images by optical proximity correction
Application Number
8/655790
Publication Number
5740068
Application Date
May 30, 1996
Publication Date
April 14, 1998
Inventor
John Edward Barth Jr
Williston
VT, US
Robert Thomas Sayah
Beacon
NY, US
Lars Wolfgang Liebmann
Poughquag
NY, US
Agent
H Daniel Schnurmann
Assignee
International Business Machines Corporation
NY, US
IPC
H01J 37/304
G03F 7/00
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