05715039 is referenced by 762 patents and cites 3 patents.

In exposing and projecting a mask onto a substrate using projection optics, a first grating is provided between the substrate and the projection optics and a second grating is provided between the projection optics and the mask so that the image of the mask pattern is formed near the substrate surface by the interference of beams diffracted by the first grating. This arrangement produces the effect of virtually increasing the NA of the optical system by up to a factor of two, making it possible to manufacture LSIs with fine patterns.

Title
Projection exposure apparatus and method which uses multiple diffraction gratings in order to produce a solid state device with fine patterns
Application Number
8/649156
Publication Number
5715039
Application Date
May 17, 1996
Publication Date
February 3, 1998
Inventor
Rudolf Murai von Bunau
Koganei
JP
Hiroshi Fukuda
Kodaira
JP
Agent
Kenyon & Kenyon
Assignee
Hitachi
JP
IPC
G03F 7/20
H01L 21/27
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