05672760 is referenced by 4 patents and cites 31 patents.

The present invention provides an ablatively photodecomposable polymer having a photoabsorber bound to the polymer (the "ablatively photodecomposable polymer") which does not phase separate, nor does it crystallize. The ablatively photodecomposable polymer provides even ablation, high resolution and in preferred embodiments, can withstand potassium permanganate etchant and ferric chloride etchant. The ablatively photodecomposable polymer is strippable, although it can remain on the substrate if desired. The ablatively photodecomposable polymer comprises a polymer to which a photoabsorber is bound, either covalently or ionically. The present invention is also directed to a process for forming a metal pattern on a substrate employing the ablatively photodecomposable polymer.

Title
Ablatively photodecomposable compositions
Application Number
476760
Publication Number
5672760
Application Date
April 9, 1996
Publication Date
September 30, 1997
Inventor
Randy William Snyder
Vestal
NY, US
Victor Yee Way Lee
San Jose
CA, US
William Weathers Fleming
Virginia Beach
VA, US
Francis Charles Burns
Apalachin
NY, US
Agent
Calfee Halter & Griswold
Assignee
International Business Machines Corporation
NY, US
IPC
C07C 317/32
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