05646413 is referenced by 250 patents and cites 10 patents.

There is disclosed an exposure method for transferring, using an optical system for illuminating a mask having patterns to be transferred on a substrate and a projection optical system for projecting images of the patterns to the substrate, the patterns to the substrate through the projection optical system by means of scanning the mask and the substrate synchronously relative to the projection optical system. The method comprises the steps of providing a plurality of measuring marks on the mask formed along a relative scanning direction, and providing a plurality of reference marks formed on the stage corresponding to the measuring marks, respectively, moving the mask and the substrate synchronously in the relative scanning direction to measure successively a displacement amount between the measuring marks on the mask and the reference marks, and obtaining a correspondence relation between a coordinate system on the mask and a coordinate system on the stage according to the displacement amount.

Title
Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement
Application Number
203037
Publication Number
5646413
Application Date
February 28, 1996
Publication Date
July 8, 1997
Inventor
Kenji Nishi
Yokohama
JP
Agent
Shapiro & Shapiro
Assignee
Nikon Corporation
JP
IPC
G01N 21/86
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