05610683 is referenced by 1008 patents and cites 10 patents.

A projection exposure apparatus includes an illuminating device for illuminating a pattern of an original, a holder for holding a substrate, and a projection system for projecting an image of the pattern of the original onto the substrate. The projection system includes a projection optical system and a plane optical element spaced from the projection optical system and disposed opposite to the surface of the substrate. Also provided is a casing having a filled interspace formed between the optical element and the substrate, with the optical element providing an upper cover of the casing.

Title
Immersion type projection exposure apparatus
Application Number
156707
Publication Number
5610683
Application Date
June 5, 1995
Publication Date
March 11, 1997
Inventor
Kazuo Takahashi
Utsunomiya
JP
Agent
Fitzpatrick Cella Harper & Scinto
Assignee
Canon Kabushiki Kaisha
JP
IPC
G03B 27/42
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