05587274 is referenced by 7 patents and cites 8 patents.

Disclosed is a positive type resist composition which can form a good pattern by subjecting a resist layer to plural exposures and developments, which results in excellent adhesion between the resist layer and a substrate. The composition comprises:

(a) a polymer having an acid value of 2 to 200, prepared from 20 to 94% by weight of a t-butyl ester of a .alpha.,.beta.-ethylenically unsaturated carboxylic acid, 5 to 79% by weight of a (meth)acrylate of the formula:

Title
Resist composition
Application Number
77377
Publication Number
5587274
Application Date
December 7, 1994
Publication Date
December 24, 1996
Inventor
Atsushi Kawakami
Suita
JP
Akira Matsumura
Hirakata
JP
Takahito Kishida
Yao
JP
Agent
Wenderoth Lind & Ponack
Assignee
Nippon Paint
JP
IPC
G03C 1/73
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