05565286 is referenced by 49 patents and cites 8 patents.

A structure and fabrication method for a phase-shifting lithographic mask wherein an attenuated phase-shifting mesh structure (Att PSM) is combined with an alternating-element phase shifting mask (Alt PSM) to provide a mask combination consisting of phase-shifted and unshifted attenuated backgrounds in which the phase-shifted attenuated backgrounds surrounds the unshifted components and the unshifted attenuated background surrounds the phase-shifted components.

Title
Combined attenuated-alternating phase shifting mask structure and fabrication methods therefor
Application Number
8/340992
Publication Number
5565286
Application Date
November 17, 1994
Publication Date
October 15, 1996
Inventor
Burn J Lin
Tampa
FL, US
Agent
Perman & Green
Assignee
International Business Machines Corporation
NY, US
IPC
G03F 9/00
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