05492793 is referenced by 69 patents and cites 32 patents.

The present invention relates to an improved chemically amplified photoresist composition comprising (i) a photosensitive acid generator and (ii) a polymer comprising the reaction product of hydroxystyrene with acrylate, methacrylate or a mixture of acrylate and methacrylate.

Title
Photoresist composition
Application Number
970745
Publication Number
5492793
Application Date
May 11, 1994
Publication Date
February 20, 1996
Inventor
Ratnam Sooriyakumaran
East Fishkill
NY, US
Hiroshi Ito
San Jose
CA, US
Christopher J Knors
Bound Brook
NJ, US
Gregory Breyta
San Jose
CA, US
Agent
Robert B Martin
Assignee
International Business Machines Corporation
NY, US
IPC
G03F 7/022
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