05432714 is referenced by 65 patents and cites 15 patents.

In electron beam lithography, an apparatus and method decompose rectangles at the exterior of a desired electron beam exposure pattern into portions having a substantially constant environment. This process also includes sorting of rectangles into bands in order of addresses of the rectangles and the assignment of labels or tags to the resulting rectangles indicating the edge(s) of the rectangle at which cuts were made to form the rectangle. When these rectangles are further decomposed by increment cutting and processes to receive exposure doses corrected by mutual proximity effects, including recombination of rectangles having the same assigned exposure dose, improved location of cut boundaries is achieved. Overexposure and resultant blooming of the pattern is prevented and exposure dose is assigned with higher accuracy since any averaging of exposure dose will be over a region having a substantially constant environment of neighboring shapes. Additionally, by ordering of the shapes, and cutting (with recombination) in plural steps, data carried forward in subsequent processing is reduced and accumulation of exposure correction information is facilitated.

Title
System and method for preparing shape data for proximity correction
Application Number
10715
Publication Number
5432714
Application Date
September 2, 1994
Publication Date
July 11, 1995
Inventor
James E Stuart
Hopewell Junction
NY, US
Joseph B Frei
Hopewell Junction
NY, US
Virginia M Chung
Pleasant Valley
NY, US
Agent
Whitham Curtis Whitham & McGinn
Agent
Charles W Peterson Jr
Assignee
International Business Machines Corporation
NY, US
IPC
G02B 27/00
G06F 15/00
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