05404894 is referenced by 106 patents and cites 22 patents.

A thermal processing station is provided with a first conveyor that conveys a wafer from a first conveyor access portion and a second conveyor that conveys another wafer from a second conveyor access opening portion. The wafer conveyed from the first conveyor is conveyed along a route consisting of the second conveyor, a washing portion, the second conveyor again, the first conveyor, and a thermal processing portion. On the other hand, the wafer conveyed from the second conveyor is conveyed along a route consisting of the washing portion, the second conveyor again, the first conveyor, and the thermal processing portion. An intermediate transfer portion that is free to rotate and rise and lower is provided between the first and second conveyor. A control section does not rotate the intermediate transfer portion while the wafer is being transferred along the former route, but it does rotate the intermediate transfer portion through 180.degree. for the latter route, to keep the orientation of wafers constant during the thermal processing. In this manner, the orientation of objects to be processed, such as semiconductor wafers, can be easily managed during thermal processing.

Title
Conveyor apparatus
Application Number
8/62611
Publication Number
5404894
Application Date
May 18, 1993
Publication Date
April 11, 1995
Inventor
Hirotsugu Shiraiwa
Hino
JP
Agent
Beveridge DeGrandi Weilacher & Young
Assignee
Tokyo Electron Tohoku Kabushiki Kaisha
JP
Tokyo Electron Kabushiki Kaisha
JP
IPC
B65G 51/02
View Original Source