05403695 is referenced by 58 patents and cites 19 patents.

Disclosed herein is a resist for forming patterns, which is greatly sensitive to ultraviolet rays an ionizing radiation, and which can therefore form a high-resolution resist pattern if exposed to ultra violet rays or an unionizing radiation. Hence, the resist is useful in a method of manufacturing semicon ductor devices having high integration densities. The resist comprises tert-butoxycarbonyl methoxypolyhydroxy styrene and an o-quinonediazide compound.

Title
Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups
Application Number
7/876457
Publication Number
5403695
Application Date
April 30, 1992
Publication Date
April 4, 1995
Inventor
Shuzi Hayase
Kawasaki
JP
Yoshihito Kobayashi
Kawasaki
JP
Naohiko Oyasato
Kawaguchi
JP
Hirokazu Niki
Yokohama
JP
Yasunobu Onishi
Yokohama
JP
Rumiko Hayase
Kawasaki
JP
Agent
Oblon Spivak McClelland Maier & Neustadt
Assignee
Kabushiki Kaisha Toshiba
JP
IPC
G03F 7/30
G03F 7/023
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