05380608 is referenced by 9 patents and cites 4 patents.

The invention is directed to a phase shift photomask for which a film made of a material capable of providing an etching stopper layer that excels in etching selectivity and can interrupt etching surely and automatically, and provides a phase shift photomask at least comprising a substrate 30 and a phase shifter pattern made of a material composed mainly of silicon oxide that is provided on the surface of the substrate directly or with an opaque layer 37 interposed therebetween, said phase shift photomask being characterized in that the surface 30 is provided on the surface with an etching stopper layer 30 that comprises a mixture of Al.sub.2 O.sub.3 with MgO, ZrO.sub.2, Ta.sub.2 O.sub.5 or HfO, or CrO.sub.x, CrN.sub.y, CrC.sub.z, CrO.sub.x N.sub.y, CrO.sub.x C.sub.z or CrO.sub.x N.sub.y C.sub.z, or MgF.sub.2-2x O.sub.y, CaF.sub.2-2x O.sub.y, LiF.sub.2-2x O.sub.y, BaF.sub.2-2x O.sub.y, La.sub.2 F.sub.6-2x O.sub.y or Ce.sub.2 F.sub.6-2x O.sub.y, whereby the etching stopper layer is allowed to etch a transparent film for a phase shifter surely and accurately, when making a phase shifter pattern by etching.

Title
Phase shift photomask comprising a layer of aluminum oxide with magnesium oxide
Application Number
7/974919
Publication Number
5380608
Application Date
November 12, 1992
Publication Date
January 10, 1995
Inventor
Hiroshi Mohri
Tokyo
JP
Masahiro Takahashi
Tokyo
JP
Hiroyuki Miyashita
Tokyo
JP
Agent
Dellett and Walters
Assignee
Dai Nippon Printing
JP
IPC
G03F 9/00
View Original Source