05296271 is referenced by 15 patents and cites 6 patents.

Photoreactive polymers are treated by exposure to microwave energy. A film of a photoreactive polymer (12), such as a photoresist, is applied to a substrate (10) and selectively exposed to ultraviolet light. The latent image produced is further cured or polymerized by treating the photoresist with microwave energy. Combinations of microwave and thermal energies are also used. The treated photoresist is then developed, producing a sidewall (17) that is vertical, and is improved by reduction of anomolies such as scum or a foot (16) at the base of the resist.

Title
Microwave treatment of photoresist on a substrate
Application Number
714947
Publication Number
5296271
Application Date
January 12, 1993
Publication Date
March 22, 1994
Inventor
James L Davis
Coral Springs
FL, US
Richard J Kolcz
North Lauderdale
FL, US
Thomas J Swirbel
Davie
FL, US
Agent
Dale W Dorinski
Assignee
Motorola
IL, US
IPC
B05D 1/32
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