05286581 is referenced by 40 patents and cites 2 patents.

A method is provided for fabricating a phase-shift mask (10, 30). A mask plate (11, 31) is provided. A semitransparent layer (12, 32) is deposited onto the mask plate (11,31). The semitransparent layer (12, 32) is then patterned into a predetermined geometric pattern. The patterning of the semitransparent layer (12, 32) is then continued into the mask plate (11, 31) for a predetermined distance (38), thus providing a phase-shift mask (10, 30).

Title
Phase-shift mask and method for making
Application Number
7/746546
Publication Number
5286581
Application Date
August 19, 1991
Publication Date
February 15, 1994
Inventor
Fourmun Lee
Chandler
AZ, US
Agent
Joe E Barbee
Gary F Witting
Assignee
Motorola
IL, US
IPC
G03F 9/00
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