05272417 is referenced by 133 patents and cites 4 patents.

A plasma process device for a generating a plasma in a container under reduced pressure and for processing an object. First and second electrodes are placed in opposed positions in the container. The electrodes are plate-like in shape. A protective member made of a stable material covers the first electrode. A means is provided for mounting the object to be processed on the second electrode. A first high-frequency power source is connected to the first electrode. A second high-frequency power source is connected to the second electrode. A gas supply for introducing desired gas into the container is provided. Frequency of the first high-frequency power source is higher than the frequency of the second high-frequency power source.

Title
Device for plasma process
Application Number
602225
Publication Number
5272417
Application Date
November 13, 1990
Publication Date
December 21, 1993
Inventor
Tadahiro Ohmi
1-17-301, Komegabukuro 2-chome, Aoba-ku, Sendai-shi, Miyagi-ken 980
JP
Agent
Baker & Daniels
IPC
C23F 4/00
H05H 1/46
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