05252807 is referenced by 171 patents and cites 8 patents.

A rapid thermal processor for heat treating and cooling semiconductor material in an elongated process chamber having a base, side and top walls which enclose a heater plate assembly through which thin pins longitudinally move to carry workpieces vertically to and from the heater assembly. A cooling shutter is adapted in the chamber to shield the workpiece from the heater plate when the cooling process takes place. The chamber has gaseous ambient control means which regulates the type of atmosphere or vacuum in the chamber during heat processing of the workpieces.

Title
Heated plate rapid thermal processor
Application Number
547805
Publication Number
5252807
Application Date
October 23, 1991
Publication Date
October 12, 1993
Inventor
George Chizinsky
143 West St., Beverly Farms, 01915
MA, US
Agent
Don Halgren
IPC
H01L 21/22
F27D 3/00
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