05242770 is referenced by 288 patents and cites 1 patents.

An improvement for reducing proximity effects comprised of additional lines, referred to as intensity leveling bars, into the mask pattern. The leveling bars perform the function of adjusting the edge intensity gradients of isolated edges in the mask pattern, to match the edge intensity gradients of densely packed edges. Leveling bars are placed parallel to isolated edges such that intensity gradient leveling occurs on all isolated edges of the mask pattern. In addition, the leveling bars are designed to have a width significantly less than the resolution of the exposure tool. Therefore, leveling bars that are present in the mask pattern produce resist patterns that completely developed away when a nominal exposure energy is utilized during exposure of photoresist.

Title
Mask for photolithography
Application Number
7/821793
Publication Number
5242770
Application Date
January 16, 1992
Publication Date
September 7, 1993
Inventor
James A Matthews
Milpitas
CA, US
Jang F Chen
San Jose
CA, US
Assignee
MicroUnity Systems Engineering
CA, US
IPC
G03F 9/00
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