05217501 is referenced by 55 patents and cites 6 patents.

A vertical wafer heat treatment apparatus for for forming a film on and dry etching a plurality of wafers stored in a wafer boat. The apparatus has at least first and second load lock chambers connected by a gate. Each load lock has an inert gas independently introduced therein and exhausted therefrom. The load lock chambers are vertically connected between two separate process containers. An elevator is provided in the first load lock chamber to transfer a wafer boat into and out of the first container. A transfer means is provided in the second load lock to transfer wafers into and out of a wafer boat.

Title
Vertical wafer heat treatment apparatus having dual load lock chambers
Application Number
554447
Publication Number
5217501
Application Date
July 12, 1991
Publication Date
June 8, 1993
Inventor
Hisashi Hattori
Tama
JP
Hirofumi Kitayama
Aikawa
JP
Noboru Fuse
Yokohama
JP
Agent
Oblon Spivak McClelland Maier & Neustadt
Assignee
Tokyo Electron Sagami
JP
Tokyo Electron
JP
IPC
C23C 14/56
H01L 21/50
H01L 21/46
H01L 21/30
View Original Source