05194893 is referenced by 176 patents and cites 9 patents.

A projection exposure apparatus carries out scan exposure with illumination flux of slit(s) by moving a mask and a substrate in a direction of one-dimension at synchronized speeds with each other. The mask is inclined with a predetermined angle relative to the substrate in the direction of one-dimensional movement. The substrate is also moved in a direction of optical axis of projection optical system when moved in the direction of one-dimension, such that a central part of transfer area on the substrate is located on a best focal plane of projection optical system upon scan exposure.

Title
Exposure method and projection exposure apparatus
Application Number
7/845065
Publication Number
5194893
Application Date
March 3, 1992
Publication Date
March 16, 1993
Inventor
Kenji Nishi
Kawasaki
JP
Agent
Shapiro and Shapiro
Assignee
Nikon Corporation
JP
IPC
G03B 27/42
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