05194345 is referenced by 41 patents and cites 5 patents.

A method of fabricating phase shifting reticles that can be used as a mask in photolithographic processes such as semiconductor wafer patterning. An opaque material is deposited onto a quartz substrate to a predetermined thickness. The opaque material is then patterned with openings to form a pattern of opaque light blockers and light transmission openings on the substrate. A phase shifter material is then deposited over the opaque light blockers and into the light transmission openings. This forms a pattern of rim phase shifters on the sidewalls of each light blocker with a light transmission opening between adjacent light blockers. In use, in photopatterning a semiconductor wafer, phase canceling produced by light diffracted through the rim phase shifters and by the opaque light blockers enhances the edge contrast of a pattern produced by the opaque light blockers.

Title
Method of fabricating phase shift reticles
Application Number
7/699752
Publication Number
5194345
Application Date
May 14, 1991
Publication Date
March 16, 1993
Inventor
J Brett Rolfson
Boise
ID, US
Agent
Stephen A Gratton
Assignee
Micron Technology
ID, US
IPC
G03F 9/00
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