05186718 is referenced by 472 patents and cites 23 patents.

A processing system for workpieces such as semiconductor wafers is disclosed which incorporates multiple, isolated vacuum stages between the cassette load lock station and the main vacuum processing chambers. A vacuum gradient is applied between the cassette load lock and the main processing chambers to facilitate the use of a very high degree of vacuum in the processing chambers without lengthy pump down times. Separate robot chambers are associated with the vacuum processing chambers and the load lock(s). In addition, separate transport paths are provided between the two robot chambers to facilitate loading and unloading of workpieces. Pre-treatment and post-treatment chambers may be incorporated in the two transport paths.

Title
Staged-vacuum wafer processing system and method
Application Number
355008
Publication Number
5186718
Application Date
April 15, 1991
Publication Date
February 16, 1993
Inventor
Dan Maydan
Los Altos Hills
CA, US
Sasson Somekh
Los Altos Hills
CA, US
Howard Grunes
Santa Cruz
CA, US
Avi Tepman
Cupertino
CA, US
Agent
Philip A Dalton
Assignee
Applied Materials
CA, US
IPC
C23C 13/08
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