05121160 is referenced by 53 patents and cites 16 patents.

An exposure method, includes the steps of directing a radiation beam to a substrate to be exposed; and substantially correcting any change in the size of the radiation beam. Also, there is disclosed an exposure apparatus, which includes a laser for emitting a laser beam; a detector for detecting any change in the size of the laser beam; and a device for directing the laser beam to a substrate to be exposed, the directing device including a compensator responsive to an output signal from the detector for substantially correcting the change in the beam size.

Title
Exposure method and apparatus
Application Number
490451
Publication Number
5121160
Application Date
June 18, 1991
Publication Date
June 9, 1992
Inventor
Takahisa Shiozawa
Yokohama
JP
Hitoshi Nakano
Kawasaki
JP
Masato Aketagawa
Yokohama
JP
Naoto Sano
Kunitachi
JP
Agent
Fitzpatrick Cella Harper & Scinto
Assignee
Canon Kabushiki Kaisha
JP
IPC
G03B 27/32
G03B 27/72
G03B 27/42
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