05103274 is referenced by 23 patents and cites 4 patents.

A method and apparatus for self-aligning a source region with a field oxide region and a polysilicon gate and word line in a semiconductor device. This method and apparatus allows reduced memory cell size and improved device density by substantially eliminating the bird's beak encroachment and corner rounding effects usually found between neighboring cells due to inadequacies in the prior art photolighography process.

Title
Self-aligned source process and apparatus
Application Number
621284
Publication Number
5103274
Application Date
March 20, 1991
Publication Date
April 7, 1992
Inventor
Wen Juei Lu
Sunnyvale
CA, US
Daniel N Tang
San Jose
CA, US
Agent
Blakely Sokoloff Taylor & Zafman
Assignee
Intel Corporation
CA, US
IPC
H01L 27/12
H01L 29/78
H01L 29/06
H01L 29/68
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