05096550 is referenced by 173 patents and cites 6 patents.

In an electropolishing or electrolytic etching apparatus the anode is separated from the cathode to prevent bubble transport to the anode and to produce a uniform current distribution at the anode by means of a solid nonconducting anode-cathode barrier. The anode extends into the top of the barrier and the cathode is outside the barrier. A virtual cathode hole formed in the bottom of the barrier below the level of the cathode permits current flow while preventing bubble transport. The anode is rotatable and oriented horizontally facing down. An extended anode is formed by mounting the workpiece in a holder which extends the electropolishing or etching area beyond the edge of the workpiece to reduce edge effects at the workpiece. A reference electrode controls cell voltage. Endpoint detection and current shut-off stop polishing. Spatially uniform polishing or etching can be rapidly performed.

Title
Method and apparatus for spatially uniform electropolishing and electrolytic etching
Application Number
7/597225
Publication Number
5096550
Application Date
October 15, 1990
Publication Date
March 17, 1992
Inventor
Anthony F Bernhardt
Berkeley
CA, US
Robert J Contolini
Pleasanton
CA, US
Steven T Mayer
Piedmont
CA, US
Agent
William R Moser
L E Carnahan
Henry P Sartorio
Assignee
The United States of America represented by the United States Department of Energy
DC, US
IPC
C25F 7/00
C25F 3/16
C25F 3/02
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