05000682 is referenced by 30 patents and cites 6 patents.

Semiconductor wafers within a supporting vertical wafer tower are positioned within a vertical process chamber through a lower gate valve fixed to a supporting framework. The gate valve is sealed to a similar gate valve at the upper end of a movable load lock on the framework, within which the wafers are subjected to pre-treatment and post-treatment processes. Two load locks are alternately used in conjunction with the process chamber and a wafer loading station on the framework. In addition, a cleaning element is movably mounted on the framework for periodically maintaining the interior surfaces of the process tube within the process chamber.

Title
Vertical thermal processor for semiconductor wafers
Application Number
7/467937
Publication Number
5000682
Application Date
January 22, 1990
Publication Date
March 19, 1991
Inventor
Larry M Beasley
Austin
TX, US
Raymon F Thompson
Kalispell
MT, US
Worm Lund
Seattle
WA, US
Steve Thompson
Kalispell
MT, US
Donald W Heidt
Whitewright
TX, US
Agent
Wells St John & Roberts
Assignee
Semitherm
MT, US
IPC
F27D 3/12
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