04995958 is referenced by 48 patents and cites 5 patents.

A magnetron sputtering apparatus includes a rotatable magnet. At least a portion of the centerline of the magnet lies on a curve defined by ##EQU1## where .xi.(u) is a preselected erosion profile. When stationary, the magnet generates a localized magnetic field of approximately constant width. In operation, when the magnet is rotated, it generates the preselected erosion profile in the target. The preselected erosion profile may be constant.

Title
Sputtering apparatus with a rotating magnet array having a geometry for specified target erosion profile
Application Number
7/355713
Publication Number
4995958
Application Date
May 22, 1989
Publication Date
February 26, 1991
Inventor
John C Helmer
Palo Alto
CA, US
Robert L Anderson
Palo Alto
CA, US
Agent
Sheri M Novack
Stanley Z Cole
Assignee
Varian Associates
CA, US
IPC
C23C 14/35
View Original Source