04838201 is referenced by 17 patents and cites 5 patents.

A vacuum chemical epitaxy apparatus comprising a first mixing chamber having an inlet for introducing a metal-organic gaseous materials and n-type and p-type dopants, and a plurality of outlets for directing the flow of said metal-organic gases and n-type and p-type dopants toward a substrate; a second mixing chamber disposed below said first chamber having an inlet for introducing a metal-organic gaseous material and n-type and p-type dopants, and a plurality of passages through said first chamber and an outlet for each passage, wherein the passage outlets are in substantially the same plane with the outlets of the first chamber; and means for exhausting the metal-organic gaseous materials and n-type and p-type dopants from the second chamber.

Title
Apparatus and process for vacuum chemical epitaxy
Application Number
6/941005
Publication Number
4838201
Application Date
December 12, 1986
Publication Date
June 13, 1989
Inventor
John A Cape
San Rafael
CA, US
Paul S McLeod
Berkeley
CA, US
Lewis M Fraas
El Sobrante
CA, US
Agent
Armstrong Nikaido Marmelstein Kubovcik & Murray
Assignee
Daido Sanso
JP
IPC
C23C 16/00
View Original Source