04792463 is referenced by 29 patents and cites 10 patents.

Method of producing a ferroelectric thin film by chemical vapor deposition, by providing a gaseous mixture containing oxygen and a gaseous raw material containing (A) alkyl lead and or alkyl bismuth together with an alcoholate of titanium, zirconium, silicon, germanium or niobium, (B) alkyl lead and alkyl germanium, or (C) alkyl bismuth and alkyl lead, and reacting the oxygen and gaseous raw material to oxidize the components of (A), (B) or (C), to form the thin film on the substrate.

Title
Method of producing ferroelectric thin film
Application Number
6/903134
Publication Number
4792463
Application Date
September 3, 1986
Publication Date
December 20, 1988
Inventor
Katsuhiko Tomita
Kyoto
JP
Masaru Okada
21 Banchi, Kandaijin-cho, Kasugai-city, Aichi-prefecture
JP
Agent
Wenderoth Lind & Ponack
Assignee
Horiba
JP
Masaru Okada
JP
IPC
C23C 16/40
B05D 5/12
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