04786361 is referenced by 18 patents and cites 16 patents.

A process is disclosed which etches a workpiece, with an etching mask of a predetermined pattern formed on the surface of the workpiece, on an apparatus which includes a container for holding first and second electrodes opposite to each other and a magnetic field generator arranged on a side opposite to that side of the second electrode where the second electrode faces the first electrode, which comprises placing the workpiece on the first electrode, supplying a feed gas into the container, evacuating air in the container to set pressure in the container at a level of 10.sup.-2 torrs, and applying high frequency power across the first and second electrodes to yield plasma whereby the workpiece is etched.

Title
Dry etching process
Application Number
7/22368
Publication Number
4786361
Application Date
March 5, 1987
Publication Date
November 22, 1988
Inventor
Yasuhiro Horiike
Tokyo
JP
Haruo Okano
Tokyo
JP
Makoto Sekine
Yokohama
JP
Agent
Oblon Fisher Spivak McClelland & Maier
Assignee
Kabushiki Kaisha Toshiba
JP
IPC
B44C 1/22
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